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• 资讯公开站Digitimes2026年10月12日 6:16

  TSMC, ASML eye 12-inch photomasks to unlock High-NA EUV's full-field potential

  Advanced semiconductor manufacturing is progressing toward 2nm and angstrom-era nodes (Å; where 1 nm equals 10 Å), bringing high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography into focus.

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